10:45 〜 11:00

[B-3-05] A Design-analysis Flow Considering Mechanical Stability of Metal Masks for Organic CMOS Circuits

^○M. Shintani¹, K. Kuribara², Y. Ogasahara², M. Hiromoto¹, T. Sato¹ (1.Kyoto Univ. (Japan), 2.AIST (Japan))

https://doi.org/10.7567/SSDM.2017.B-3-05