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[C-1-06 (Late News)] Characterization of Amorphous Silicon Passivation Layer Deposited by Facing Target Sputtering Using Temperature-Dependent Minority Carrier Lifetime Measurement

^○Y. Shiratori¹, K. Nakada¹, S. Miyajima¹ (1.Tokyo Tech (Japan))

https://doi.org/10.7567/SSDM.2017.C-1-06