N5 BEOL Process Options Patterning flows Comparing 193immersion to Hybrid EUV or Full EUV

S. Lariviere

doi:https://doi.org/10.7567/SSDM.2017.H-3-05

11:00 AM - 11:20 AM

[H-3-05] N5 BEOL Process Options Patterning flows Comparing 193immersion to Hybrid EUV or Full EUV

^○S. Lariviere¹, B. Briggs¹, C. Wilson¹, D. Wan¹, A. Mallik¹, S. Decoster¹, J. Bekaert¹, V. Blanco¹, M. Mao¹, S. Paolillo¹, B. K. Kotowska¹, J. Versluijs¹, J. Boemmels¹, D. Trivkovic¹, Z. Tokei¹, G. Mcintyre¹, D. Mocuta¹ (1.IMEC (Belgium))

https://doi.org/10.7567/SSDM.2017.H-3-05

2017 International Conference on Solid State Devices and Materials

[H-3-05] N5 BEOL Process Options Patterning flows Comparing 193immersion to Hybrid EUV or Full EUV