10:30 AM - 10:50 AM [K-3-04] Role of Y-doping into GeO2 in Ge gate stack reliability ○X. Tang1,2, A. Toriumi1 (1.Univ. of Tokyo (Japan), 2.Nanjing Univ. (China)) https://doi.org/10.7567/SSDM.2017.K-3-04