10:30 〜 10:50

[K-3-04] Role of Y-doping into GeO₂ in Ge gate stack reliability

^○X. Tang^1,2, A. Toriumi¹ (1.Univ. of Tokyo (Japan), 2.Nanjing Univ. (China))

https://doi.org/10.7567/SSDM.2017.K-3-04