The Japan Society of Applied Physics

2:50 PM - 3:10 PM

[K-4-03] S/D Contact Solutions to Enable Contact Resistivity <1E-9 for 5nm and Beyond

C. -Y. Chang1, F. A. Khaja1, K. E. Hollar1, K. V. Rao1, S. Munnanqi1, Y. Chen1, M. Okazaki1, Y. -C. Huang1, X. Li1, H. Chung1, O. Chan1, C. Lazik1, M. Jin1, H. Zhou1, A. Mayur1, R. Hung1, N. Kim1 (1.Applied Materials, Inc (USA))