10:20 〜 10:40

[K-5-03] Thickness-dependent ferroelectric phase evolution in doped HfO₂

^○L. Xu¹, T. Nishimura¹, S. Shibayama¹, T. Yajima¹, S. Migita², A. Toriumi¹ (1.Univ. of Tokyo (Japan), 2.AIST (Japan))

https://doi.org/10.7567/SSDM.2017.K-5-03