10:40 〜 10:55

[K-5-04 (Late News)] Direct Evidence of 3-nm-thick Ferroelectric HfO₂

^○X. Tian¹, S. Shibayama¹, T. Nishimura¹, T. Yajima¹, S. Migita², A. Toriumi¹ (1.Univ. of Tokyo (Japan), 2.AIST (Japan))

https://doi.org/10.7567/SSDM.2017.K-5-04