14:45 〜 15:00

[M-4-04] Effects of Deposition Temperature of Amorphous Precursors on Solid-Phase Crystallized Si_1−xGe_xThin Films on an Insulator

^○D. Takahara¹, K. Toko¹, R. Yoshimine¹, T. Suemasu¹ (1.Univ. of Tsukuba (Japan))

https://doi.org/10.7567/SSDM.2017.M-4-04