15:00 〜 15:15

[M-4-05] Deposition mechanism of thin Si and Ge films promoted by liquid-phase reduction under ballistic hot electron incidence

^○R. Suda¹, A. Kojima¹, N. Mori², J. Shirakashi¹, N. Koshida¹ (1.Tokyo Univ. of Agri. & Tech. (Japan), 2.Osaka Univ. (Japan))

https://doi.org/10.7567/SSDM.2017.M-4-05