The Japan Society of Applied Physics

3:00 PM - 3:15 PM

[M-4-05] Deposition mechanism of thin Si and Ge films promoted by liquid-phase reduction under ballistic hot electron incidence

R. Suda1, A. Kojima1, N. Mori2, J. Shirakashi1, N. Koshida1 (1.Tokyo Univ. of Agri. & Tech. (Japan), 2.Osaka Univ. (Japan))

https://doi.org/10.7567/SSDM.2017.M-4-05