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[O-4-01] Current conduction in H₂O-grown ALD-Al₂O₃ films on Si substrates

^○S. Okubo¹, D. Matsumura¹, K. Horikawa¹, A. Hiraiwa^1,2, H. Kawarada¹ (1.Waseda Univ. (Japan), 2.Nagoya Univ. (Japan))

https://doi.org/10.7567/SSDM.2017.O-4-01