[PS-10-03] Oxygen plasma treatment for wettability improvement of alkyl terminal self-assembled monolayer as gate dielectrics

^○K. Kuribara¹, Y. Tanaka², T. Nobeshima¹, T. Kazasa¹, M. Yoshida¹ (1.AIST (Japan), 2.Ube Industries, Ltd. (Japan))

https://doi.org/10.7567/SSDM.2017.PS-10-03