[PS-3-02] Performance enhancement of GOI tunneling FETs with source junctions formed by low energy BF2 ion implantation
T. Katoh1,○R. Matsumura1, R. Takaguchi1, M. Takenaka1, S. Takagi1
(1.Univ. of Tokyo (Japan))
https://doi.org/10.7567/SSDM.2017.PS-3-02