The Japan Society of Applied Physics

[PS-4-15 (Late News)] Strain-Enhanced Ferroelectric Aluminum-Doped Hafnium Oxides for Volatile and Nonvolatile Memories Applications

C. Liu1, C. -C. Fan1, Y. -R. Chen1, G. -L. Liou2, Y. -C. Chiu1, C. -Y. Chang2, C. -H. Cheng1, H. -H. Hsu3 (1.National Chiao Tung Univ. (Taiwan), 2.National Taiwan Normal Univ. (Taiwan), 3.National Taipei Univ. of Tech. (Taiwan))

https://doi.org/10.7567/SSDM.2017.PS-4-15