[PS-4-15 (Late News)] Strain-Enhanced Ferroelectric Aluminum-Doped Hafnium Oxides for Volatile and Nonvolatile Memories Applications

^○C. Liu¹, C. -C. Fan¹, Y. -R. Chen¹, G. -L. Liou², Y. -C. Chiu¹, C. -Y. Chang², C. -H. Cheng¹, H. -H. Hsu³ (1.National Chiao Tung Univ. (Taiwan), 2.National Taiwan Normal Univ. (Taiwan), 3.National Taipei Univ. of Tech. (Taiwan))

https://doi.org/10.7567/SSDM.2017.PS-4-15