Study on the Influence Factors of Antimony Doped Tin Oxide Thin Films With High Conductivity Deposited <i>via</i> Mist CVD

L. Liu

doi:https://doi.org/10.7567/SSDM.2017.PS-8-10

[PS-8-10] Study on the Influence Factors of Antimony Doped Tin Oxide Thin Films With High Conductivity Deposited via Mist CVD

^○L. Liu¹, T. Kawaharamura¹, T. Uchida², S. Fujita², H. Orita³, H. Kobayashi³ (1.Kochi Univ. of Tech. (Japan), 2.Kyoto Univ. (Japan), 3.TMEIC (Japan))

https://doi.org/10.7567/SSDM.2017.PS-8-10

2017 International Conference on Solid State Devices and Materials

[PS-8-10] Study on the Influence Factors of Antimony Doped Tin Oxide Thin Films With High Conductivity Deposited via Mist CVD