12:13 〜 12:15

[PS-13-20 (Late News)] Experimental Investigation of the Contact Resistance of Graphene/MoS2 Interface Treated with O2 Plasma

^○Q. Lu¹, Y. Liu¹, G. Han¹, C. Fang¹, Y. Shao², J. Zhang¹, Y. Hao¹ (1.Xi dian Univ. (China), 2.Res. Inst. of China Electric Power (China))