The Japan Society of Applied Physics

1:00 PM - 1:50 PM

[SC-B-01] CMOS Scaling and Integration: Present Status and Roadmap

T. Hiramoto1 (1.Univ. of Tokyo (Japan))

The exponential improvement by CMOS scaling still continues. The 10nm FinFET technologies are now in mass production and the 7nm FinFET technologies have been reported in conferences. The developments of the 5nm technology are under way. In this short course, the historical trends of advanced CMOS devices in the past and at present will be reviewed in terms of device speed and energy dissipation, and the future technological trends predicted by the roadmap will be outlined. On the other hand, new device aspects that are required in the IoT (Internet of Things) era will also be touched.