14:15 〜 14:30

[B-5-04] Thermal oxidation kinetics of Ge under high pressure O₂

^○X. Wang¹, T. Nishimura¹, T. Yajima¹, A. Toriumi¹ (1.Univ. of Tokyo (Japan))

https://doi.org/10.7567/SSDM.2018.B-5-04