2:15 PM - 2:30 PM [B-5-04] Thermal oxidation kinetics of Ge under high pressure O2 ○X. Wang1, T. Nishimura1, T. Yajima1, A. Toriumi1 (1.Univ. of Tokyo (Japan)) https://doi.org/10.7567/SSDM.2018.B-5-04