15:15 〜 15:45

[B-6-01 (Invited)] Atomic Layer Etching - Breaking Through the Limitation of Etch

^○K. Nojiri¹, K.J. Kanarik², S. Tan², E.A. Hudson², R.A. Gottscho² (1.Lam Res. Co., Ltd. (Japan), 2.Lam Res. Corp. (USA))

https://doi.org/10.7567/SSDM.2018.B-6-01