Effects of heat treatment and in situ high temperature XRD study on the formation of ferroelectric epitaxial HfO<sub>2</sub> based film.

T. Mimura

doi:https://doi.org/10.7567/SSDM.2018.C-5-02

14:00 〜 14:15

[C-5-02] Effects of heat treatment and in situ high temperature XRD study on the formation of ferroelectric epitaxial HfO₂ based film.

^○T. Mimura¹, T. Shimizu¹, T. Kiguchi², A. Akama², T.J. Konno², Y. Katsuya³, O. Sakata³, H. Funakubo¹ (1.Tokyo Tech (Japan), 2.Tohoku Univ. (Japan), 3.NIMS (Japan))

https://doi.org/10.7567/SSDM.2018.C-5-02

2018 International Conference on Solid State Devices and Materials

[C-5-02] Effects of heat treatment and in situ high temperature XRD study on the formation of ferroelectric epitaxial HfO2 based film.

[C-5-02] Effects of heat treatment and in situ high temperature XRD study on the formation of ferroelectric epitaxial HfO₂ based film.