The Japan Society of Applied Physics

09:30 〜 09:45

[C-7-03] Impact of Top-ZrO2 Nucleation Layer on Ferroelectricity of HfxZr1−xO2 Thin Films for Ferroelectric Field Effect Transistor Application

T. Onaya1,2,3, T. Nabatame2, N. Sawamoto1, A. Ohi2, N. Ikeda2, T. Nagata2, A. Ogura1 (1.Meiji Univ. (Japan), 2.NIMS (Japan), 3.JSPS Research Fellow (Japan))

https://doi.org/10.7567/SSDM.2018.C-7-03