11:00 〜 11:15

[E-4-02] Growth of epitaxial Y₂O₃-doped ferroelectric HfO₂ films by sputtering method and their characterization

^○H. Funakubo¹, T. Suzkuki¹, T. Mimura¹, T. Shimizu¹, H. Uchida² (1.Tokyo Tech (Japan), 2.Sophia University (Japan))

https://doi.org/10.7567/SSDM.2018.E-4-02