Design and fabrication of sputtered AlOx/CVD SiNx/sputtered AlOx diaphragm for Spin-MEMS microphones

S. Baba

doi:https://doi.org/10.7567/SSDM.2018.G-7-03

9:45 AM - 10:00 AM

[G-7-03] Design and fabrication of sputtered AlOx/CVD SiNx/sputtered AlOx diaphragm for Spin-MEMS microphones

^○S. Baba¹, Y. Fuji¹, A. Yuzawa¹, T. Nagata¹, K. Masunishi², Y. Higashi¹, S. Kaji¹, K. Okamoto¹, T. Ono¹, M. Hara¹ (1.Corporate R & D Center, Toshiba Corp. (Japan), 2.Corporate Manufacturing Engineering Center, Toshiba Corp. (Japan))

https://doi.org/10.7567/SSDM.2018.G-7-03

2018 International Conference on Solid State Devices and Materials

[G-7-03] Design and fabrication of sputtered AlOx/CVD SiNx/sputtered AlOx diaphragm for Spin-MEMS microphones