The Japan Society of Applied Physics

09:45 〜 10:00

[G-7-03] Design and fabrication of sputtered AlOx/CVD SiNx/sputtered AlOx diaphragm for Spin-MEMS microphones

S. Baba1, Y. Fuji1, A. Yuzawa1, T. Nagata1, K. Masunishi2, Y. Higashi1, S. Kaji1, K. Okamoto1, T. Ono1, M. Hara1 (1.Corporate R & D Center, Toshiba Corp. (Japan), 2.Corporate Manufacturing Engineering Center, Toshiba Corp. (Japan))

https://doi.org/10.7567/SSDM.2018.G-7-03