09:45 〜 10:00

[N-3-03] Study on the Behaviors of HNO₃ in Highly Conductive Antimony Doped Tin Oxide Thin Films Deposited by Novel Mist CVD System

^○L. Liu¹, T. Kawaharamura¹, M. Ueda¹, G.T. Dang¹, S. Sato¹, S. Fujita², T. Hiramatsu³, H. Orita³ (1.Kochi Univ. of Tech. (Japan), 2.Kyoto Univ. (Japan), 3.Toshiba Mitsubishi-Electric Indus. Systems Corp. (Japan))

https://doi.org/10.7567/SSDM.2018.N-3-03