Time-Dependent Selective Oxidation by Low Pressure Oxidation on High-Ge-Content SiGe

W.L. Lee

doi:https://doi.org/10.7567/SSDM.2018.PS-1-22

11:00 AM - 1:30 PM

[PS-1-22] Time-Dependent Selective Oxidation by Low Pressure Oxidation on High-Ge-Content SiGe

^○W.L. Lee¹, J.L. Zhang¹, S.Y. Wang¹, M.L. Tsai¹, G.L. Luo², C.H. Chien¹ (1.National Chiao Tung Univ. (Taiwan), 2.National Nano Device Labs. (Taiwan))

https://doi.org/10.7567/SSDM.2018.PS-1-22

2018 International Conference on Solid State Devices and Materials

[PS-1-22] Time-Dependent Selective Oxidation by Low Pressure Oxidation on High-Ge-Content SiGe