The Japan Society of Applied Physics

11:00 〜 13:30

[PS-1-25] A Study of Interfacial Layer Quality and Thermal Stability of HfO2/SiGe Gate Stack by Using NH3 Plasma Treatment

C.Y. Yu1, W.L. Lee1, M.L. Tasi1, J.L. Zhang1, G.L. Luo2, C.H. Chien1 (1.National Chiao Tung Univ. (Taiwan), 2.National Nano Device Labs. (Taiwan))

https://doi.org/10.7567/SSDM.2018.PS-1-25