11:00 〜 13:30

[PS-3-03] Characterization of TiN films sputter-deposited at low temperatures

^○M. Sato¹, H. Kitada¹, M.B. Takeyama¹ (1.Kitami Inst. of Tech. (Japan))

https://doi.org/10.7567/SSDM.2018.PS-3-03