The Japan Society of Applied Physics

11:00 〜 13:30

[PS-3-11 (Late News)] Gas Phase Pore Stuffing for Damage Mitigation during Plasma Etching

T. Yamaguchi1, S. Nozawa1, M. Fujikawa1, J.-F. de Marneffe2, R. Chanson2, K.B. Gavan2, A. Rezvanov2, Fr. Lazzarino2 (1.Tokyo Electron Tchnology Solutions Ltd. (Japan), 2.Imec v.z.w. (Belgium))

https://doi.org/10.7567/SSDM.2018.PS-3-11