The Japan Society of Applied Physics

11:00 〜 13:30

[PS-4-15] High-bias-stability Al2O3 films formed by high-temperature annealing after atomic layer deposition

K. Horikawa1, A. Hiraiwa2,3,4, S. Okubo1, T. Kageura1, H. Kawarada1,2,3 (1.Waseda Univ. (Japan), 2.RONL, Waseda Univ. (Japan), 3.KMRIMST, Waseda Univ. (Japan), 4.IMaSS, Nagoya Univ. (Japan))

https://doi.org/10.7567/SSDM.2018.PS-4-15