The Japan Society of Applied Physics

11:00 〜 13:30

[PS-4-16] Warpage Reduction of Thick 4H-SiC Epitaxial Layers on the Substrates

K. Masumoto1, S. Segawa1,2, T. Ohno3, S. Tsukimoto1,4, K. Kojima1, T. Kato1, H. Okumura1 (1.AIST (Japan), 2.Asahi Diamond Indus. Corp., Ltd. (Japan), 3.Hitachi, Ltd. (Japan), 4.JFE Techno-Research Co. (Japan))

https://doi.org/10.7567/SSDM.2018.PS-4-16