Time-Dependent Selective Oxidation by Low Pressure Oxidation on High-Ge-Content SiGe

W.L. Lee

2018 International Conference on Solid State Devices and Materials

2018年9月9日〜 2018年9月13日
University of Tokyo

16:51 〜 16:52

[PS-1-22] Time-Dependent Selective Oxidation by Low Pressure Oxidation on High-Ge-Content SiGe

^○W.L. Lee¹, J.L. Zhang¹, S.Y. Wang¹, M.L. Tsai¹, G.L. Luo², C.H. Chien¹ (1.National Chiao Tung Univ. (Taiwan), 2.National Nano Device Labs. (Taiwan))

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