16:34 〜 16:35 [PS-4-05] Low Ohmic Contact Resistance on AlGaN/GaN Heterostructures Based on Ti/Al/Ti/TiN Metal Stacks ○H. Sun1, J. Chen2, P. Liu1, D. Chen1 (1.Peking University (China), 2.Founder Microelectronics International Co., Ltd. (China))
