The Japan Society of Applied Physics

4:52 PM - 4:53 PM

[PS-4-23 (Late News)] Process Damage Influence for Electrical Property of Diamond Schottky Barrier Diodes

T. Murooka1, K. Takizawa2, Y. Kato3, T. Makino3, M. Ogura3, H. Kato3, R. Wada2, S. Yamasaki3, T. Iwasaki1, H. Nohira2, M. Hatano1 (1.Tokyo Tech (Japan), 2.Tokyo City Univ. (Japan), 3.AIST (Japan))