Temperature dependence of CH 3NH 2 molecular defect in CH 3NH 3PbI 3 thin film formed by sequential vacuum evaporation

M.-C. Jung

doi:https://doi.org/10.7567/SSDM.2019.A-1-04

15:00 〜 15:15

[A-1-04] Temperature dependence of CH ₃NH ₂molecular defect in CH ₃NH ₃PbI ₃thin film formed by sequential vacuum evaporation

^○M.-C. Jung¹, I. Maeng², A. Matsuyama¹, R. Abe¹, J.-H. Yun³, M. Nakamura¹ (1.Nara Institute of Science and Technology (Japan), 2.Gwangju Institute of Science and Technology (Korea), 3.Univ. of Queensland (Australia))

https://doi.org/10.7567/SSDM.2019.A-1-04

2019 International Conference on Solid State Devices and Materials

[A-1-04] Temperature dependence of CH 3NH 2 molecular defect in CH 3NH 3PbI 3 thin film formed by sequential vacuum evaporation

[A-1-04] Temperature dependence of CH ₃NH ₂molecular defect in CH ₃NH ₃PbI ₃thin film formed by sequential vacuum evaporation