4:45 PM - 5:00 PM
[F-2-03] Fabrication of GaN high-aspect fine nano-hole array structures by hydrogen atmosphere anisotropic thermal etching with ammonia gas
○Y. Moriya1, Y. Ooe1, Y. Kawasaki1, D. Ito1, A. Kikuchi1,2
(1.Sophia Univ. (Japan), 2.Sophia Photonics Res. Center (Japan))
https://doi.org/10.7567/SSDM.2019.F-2-03