The Japan Society of Applied Physics

9:30 AM - 9:45 AM

[F-5-03] Novel approach for Growth Mechanism of Atomic Layer Epitaxy of GaAs and AlAs

N. Ohtsuka1, M. Oda1, T. Eshita1,2, I. Tanaka1, C. Itoh1 (1.Wakayama Univ. (Japan), 2.Fujitsu Semiconductor LTD. (Japan))

https://doi.org/10.7567/SSDM.2019.F-5-03