The Japan Society of Applied Physics

11:15 〜 11:30

[F-6-04] Low Temperature (< 130oC) Formation of Crystalline Ge Film on Insulator by Stress Stimulated GILC

T. Nishijima1, K. Kusano1, K. Kudo1, M. Furuta2, Y. Kusuda2, S. Motoyama2, N. Naka3, T. Numata4, I. Tsunoda1 (1.National Inst. of Tech., Kumamoto College (Japan), 2.SAMCO Inc. (Japan), 3.HORIBA Ltd. (Japan), 4.HORIBA TECHNO SERVICE Co., Ltd (Japan))

https://doi.org/10.7567/SSDM.2019.F-6-04