15:30 〜 15:45

[G-4-01] Development of High Yield Layer Transfer Process of Single Crystalline Silicon Thin Film on Plastic Substrate and Its Application to Floating Gate Memory Fabrication

^○T. Hirano¹, R. Mizukami¹, T. Yamashita¹, F. Kondo¹, H. Hanafusa¹, Y. Mizukawa¹, S. Higashi¹ (1.Hiroshima Univ. (Japan))

https://doi.org/10.7567/SSDM.2019.G-4-01