The Japan Society of Applied Physics

15:45 〜 16:00

[H-2-01] Endurance Improvement in Ferroelectric Y-doped HfO2 Thin Films on NiSi2 with Low-Thermal Budget Processing

J. Molina Reyes1,2, T. Hoshii1, S.-I. Ohmi1, H. Funakubo1, A. Hori1, I. Fujiwara1, H. Wakabayashi1, K. Tsutsui1, K. Kakushima1 (1.Tokyo Tech (Japan), 2.Nat. Inst. of Astro. Opt. and Elect. (Mexico))

https://doi.org/10.7567/SSDM.2019.H-2-01