The Japan Society of Applied Physics

13:30 〜 13:45

[H-7-02] High Reliability CoFeB/MgO/CoFeB Magnetic Tunnel Junction FabricationUsing Low-damage Ion Beam Etching

H. Park1, A. Teramoto1, J. Tsuchimoto1,2, K. Hashimoto1, T. Suwa1, M. Hayashi1,2, R. Kuroda1, S. Sugawa1 (1.Tohoku Univ. (Japan), 2.Canon-Anelva Corp. (Japan))

https://doi.org/10.7567/SSDM.2019.H-7-02