9:30 AM - 9:45 AM

[N-5-02] Surface Modification of SiO₂ Thin Film using High-Dose Ion Implantation Technique as a Manufacturing Worthy Process

^○R. Wada¹, H. Kai¹, J. Sasaki¹, T. Kuroi¹, T. Ikejiri¹ (1.NISSIN ION EQUIPMENT CO.,LTD. (Japan))

https://doi.org/10.7567/SSDM.2019.N-5-02