13:00 〜 15:00

[PS-1-10] Effects of Plasma Nitrided Trilayer High-k Gate Dielectric on Electrical Characteristics of FinFET

^○K.-Y. Lai¹, K.-S. Chang-Liao¹, Y.-L. Li¹, D.-B. Ruan¹, S.-H. Hsu¹, Y.-Z. Chien¹, B.-X. Lu¹ (1.National Tsing Hua Univ. (Taiwan))

https://doi.org/10.7567/SSDM.2019.PS-1-10