Growth mechanism of Zinc Oxide thin film by mist-CVD via the modulation of [H<sub>2</sub>O]/[Zn] ratios

P. Rutthongjan

doi:https://doi.org/10.7567/SSDM.2019.PS-10-05

1:00 PM - 3:00 PM

[PS-10-05] Growth mechanism of Zinc Oxide thin film by mist-CVD via the modulation of [H₂O]/[Zn] ratios

^○P. Rutthongjan¹, M. Nishi¹, L. Liu^1,2, S. Sato¹, G.T. Dang^1,2, T. Kawaharamura^1,2 (1.Graduated school of Engineering Kochi Univ. of Tech. (Japan), 2.Center for Nanotechnology, Research Inst. Univ. of Tech. (Japan))

https://doi.org/10.7567/SSDM.2019.PS-10-05

2019 International Conference on Solid State Devices and Materials

[PS-10-05] Growth mechanism of Zinc Oxide thin film by mist-CVD via the modulation of [H2O]/[Zn] ratios

[PS-10-05] Growth mechanism of Zinc Oxide thin film by mist-CVD via the modulation of [H₂O]/[Zn] ratios