The Japan Society of Applied Physics

1:00 PM - 3:00 PM

[PS-10-11] Atmospheric-Pressure Plasma-Enhanced Chemical Vapor Deposition of Silicon and Silicon Oxide Layers for Low-Temperature Thin Film Transistors

H. Kakiuchi1, H. Ohmi1, K. Yasutake1 (1.Osaka Univ. (Japan))

https://doi.org/10.7567/SSDM.2019.PS-10-11