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[PS-10-11] Atmospheric-Pressure Plasma-Enhanced Chemical Vapor Deposition of Silicon and Silicon Oxide Layers for Low-Temperature Thin Film Transistors

^○H. Kakiuchi¹, H. Ohmi¹, K. Yasutake¹ (1.Osaka Univ. (Japan))

https://doi.org/10.7567/SSDM.2019.PS-10-11