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[PS-10-16 (Late News)] [No-Show]Role of TiW Barrier Layer on Resistive Switching Characteristic of ZnO-nanorods Electrochemical Metallization Cell

^○P. Singh¹, F.M. Simanjuntak², S. Chandrasekaran¹, D. Panda³, T.Y. Tseng¹ (1.National Chiao Tung Univ. (Taiwan), 2.Tohoku Univ. (Japan), 3.National Inst. of Sci. and Tech. (India))